номер части Производитель / Марка Краткое описание Статус деталиТип полевого транзистораТехнологииСлив к источнику напряжения (Vdss)Ток - непрерывный слив (Id) при 25 ° CDrive Voltage (Max Rds On, Min Rds On)Rds On (Макс.) @ Id, VgsVgs (th) (Max) @ IdЗаряд затвора (Qg) (Макс.) @ VgsVgs (Макс.)Входная емкость (Ciss) (Макс.) @ VdsФункция FETРассеиваемая мощность (макс.)Рабочая ТемператураТип монтажаПакет устройств поставщикаУпаковка / чехол
Toshiba Semiconductor and Storage MOSFET N-CH 600V 11.5A TO220SIS в производствеN-ChannelMOSFET (Metal Oxide)600V11.5A (Tc)10V290 mOhm @ 5.8A, 10V4V @ 450µA25nC @ 10V±30V730pF @ 300V
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35W (Tc)150°C (TJ)Through HoleTO-220SISTO-220-3 Full Pack
Toshiba Semiconductor and Storage MOSFET N-CH 20V 0.2A CST3 в производствеN-ChannelMOSFET (Metal Oxide)20V200mA (Ta)1.5V, 4.5V2.2 Ohm @ 100mA, 4.5V1V @ 1mA
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±10V12pF @ 10V
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100mW (Ta)150°C (TJ)SMD Поверхностный монтажCST3SC-101, SOT-883
Toshiba Semiconductor and Storage MOSFET N-CH 20V 0.1A CST3 S-MOS устарелыйN-ChannelMOSFET (Metal Oxide)20V100mA (Ta)1.5V, 4V3 Ohm @ 10mA, 4V1.1V @ 100µA
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±10V9.3pF @ 3V
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100mW (Ta)150°C (TJ)SMD Поверхностный монтажCST3SC-101, SOT-883
Toshiba Semiconductor and Storage MOSFET N-CH 30V 0.1A CST3 устарелыйN-ChannelMOSFET (Metal Oxide)30V100mA (Ta)2.5V, 4V4 Ohm @ 10mA, 4V1.5V @ 100µA
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±20V7.8pF @ 3V
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100mW (Ta)150°C (TJ)SMD Поверхностный монтажCST3SC-101, SOT-883
Toshiba Semiconductor and Storage MOSFET N-CH 30V 0.1A USV в производствеN-ChannelMOSFET (Metal Oxide)30V100mA (Ta)2.5V, 4V4 Ohm @ 10mA, 4V
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±20V7.8pF @ 3V
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200mW (Ta)150°C (TJ)SMD Поверхностный монтажUSV5-TSSOP, SC-70-5, SOT-353
Toshiba Semiconductor and Storage X34 PB-F UFM S-MOS LF TRANSIST в производствеP-ChannelMOSFET (Metal Oxide)30V1.1A (Ta)4V, 10V390 mOhm @ 500mA, 10V1.8V @ 100µA
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±20V86pF @ 15V
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800mW (Ta)150°CSMD Поверхностный монтажUFM3-SMD, Flat Leads
Toshiba Semiconductor and Storage X35 PB-F POWER MOSFET TRANSISTOR в производствеN-ChannelMOSFET (Metal Oxide)20V21A (Ta)2.5V, 4.5V5.8 mOhm @ 10.5A, 4.5V1.2V @ 500µA16nC @ 5V±12V1860pF @ 10V
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1.9W (Ta), 30W (Tc)150°CSMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 20V 5A VS6 в производствеP-ChannelMOSFET (Metal Oxide)20V5A (Ta)2.5V, 4.5V55 mOhm @ 2.5A, 4.5V1.2V @ 200µA10nC @ 5V±12V690pF @ 10V
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700mW (Ta)150°C (TJ)SMD Поверхностный монтажVS-6 (2.9x2.8)SOT-23-6 Thin, TSOT-23-6
Toshiba Semiconductor and Storage MOSFET P-CH 30V 4.5A VS6 в производствеP-ChannelMOSFET (Metal Oxide)30V4.5A (Ta)
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56 mOhm @ 2.2A, 10V2V @ 100µA14nC @ 10V
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510pF @ 10V
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700mW (Ta)150°C (TJ)SMD Поверхностный монтажVS-6 (2.9x2.8)SOT-23-6 Thin, TSOT-23-6
Toshiba Semiconductor and Storage MOSFET N CH 30V 11A 8TSON-ADV в производствеN-ChannelMOSFET (Metal Oxide)30V11A (Tc)4.5V, 10V11 mOhm @ 5.5A, 10V2.3V @ 100µA7.5nC @ 10V±20V660pF @ 15V
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700mW (Ta), 19W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 40V 5A 8SOP в производствеP-ChannelMOSFET (Metal Oxide)40V5A (Ta)4.5V, 10V52 mOhm @ 2.5A, 10V2V @ 100µA20nC @ 10V+20V, -25V890pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET N CH 30V 15A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V15A (Tc)4.5V, 10V9.1 mOhm @ 7.5A, 10V2.3V @ 100µA9.8nC @ 10V±20V820pF @ 15V
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1W (Tc)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage X35 PB-FREE POWER MOSFET TRANSIS в производствеP-ChannelMOSFET (Metal Oxide)32V5.5A (Ta)4V, 10V35 mOhm @ 3A, 10V2V @ 1mA34nC @ 10V±20V1760pF @ 10V
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2.14W (Ta)150°C (TJ)SMD Поверхностный монтажPS-88-SMD, Flat Lead
Toshiba Semiconductor and Storage MOSFET N-CH 30V 9A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V9A (Ta)4.5V, 10V25 mOhm @ 4.5A, 10V2.3V @ 100µA9.5nC @ 10V±20V690pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET P-CH 30V 9A 8SOP в производствеP-ChannelMOSFET (Metal Oxide)30V9A (Ta)4.5V, 10V22 mOhm @ 4.5A, 10V2V @ 200µA39nC @ 10V+20V, -25V1650pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET N CH 60V 13A 8TSON-ADV в производствеN-ChannelMOSFET (Metal Oxide)60V13A (Ta)6.5V, 10V14 mOhm @ 6.5A, 10V4V @ 200µA15nC @ 10V±20V1300pF @ 30V
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700mW (Ta), 30W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 30V 15A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V15A (Ta)4.5V, 10V9 mOhm @ 7.5A, 10V2.3V @ 200µA25nC @ 10V±20V1800pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage X35 PB-F POWER MOSFET TRANSISTOR в производствеN-ChannelMOSFET (Metal Oxide)40V87A (Ta), 49A (Tc)4.5V, 10V6 mOhm @ 24.5A, 10V2.4V @ 200µA30nC @ 10V±20V2700pF @ 20V
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1.8W (Ta), 81W (Tc)175°CSMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 40V 15A DPAK-3 в производствеP-ChannelMOSFET (Metal Oxide)40V15A (Ta)4.5V, 10V36 mOhm @ 7.5A, 10V2V @ 100µA26nC @ 10V±20V1100pF @ 10V
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29W (Tc)150°C (TJ)SMD Поверхностный монтажDPAKTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 40V 20A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)40V20A (Ta)4.5V, 10V29 mOhm @ 10A, 10V2.3V @ 100µA15nC @ 10V±20V985pF @ 10V
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27W (Tc)150°C (TJ)SMD Поверхностный монтажDPAKTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N CH 30V 20A 8TSON-ADV в производствеN-ChannelMOSFET (Metal Oxide)30V20A (Ta)4.5V, 10V6.3 mOhm @ 10A, 10V2.3V @ 200µA24nC @ 10V±20V1370pF @ 15V
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700mW (Ta), 19W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 40V 7A 8SOP в производствеP-ChannelMOSFET (Metal Oxide)40V7A (Ta)4.5V, 10V25 mOhm @ 3.5A, 10V2V @ 200µA34nC @ 10V+20V, -25V1580pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET N-CH 30V 11A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V11A (Ta)4.5V, 10V16 mOhm @ 5.5A, 10V2.3V @ 100µA15nC @ 10V±20V1100pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET N CH 30V 38A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V38A (Tc)4.5V, 10V6 mOhm @ 19A, 10V2.3V @ 200µA17nC @ 10V±20V1400pF @ 15V
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1.6W (Ta), 34W (Tc)150°C (TJ)SMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage X35 PB-F POWER MOSFET TRANSISTOR в производствеN-ChannelMOSFET (Metal Oxide)45V139A (Ta), 80A (Tc)4.5V, 10V2.8 mOhm @ 40A, 10V2.4V @ 300µA39nC @ 10V±20V3.2nF @ 22.5V
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2.67W (Ta), 104W (Tc)175°CSMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N CH 30V 23A 8TSON-ADV в производствеN-ChannelMOSFET (Metal Oxide)30V23A (Ta)4.5V, 10V4.2 mOhm @ 11.5A, 10V2.3V @ 200µA24nC @ 10V±20V1370pF @ 15V
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700mW (Ta), 22W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 600V 2A PW-MOLD в производствеN-ChannelMOSFET (Metal Oxide)600V2A (Ta)10V4.3 Ohm @ 1A, 10V4.4V @ 1mA7nC @ 10V±30V280pF @ 25V
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60W (Tc)150°C (TJ)SMD Поверхностный монтажPW-MOLDTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage X35 PB-F POWER MOSFET TRANSISTOR в производствеN-ChannelMOSFET (Metal Oxide)100V66A (Ta), 45A (Tc)4.5V, 10V6.3 mOhm @ 22.5A, 10V2.5V @ 500µA55nC @ 10V±20V4300pF @ 50V
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2.5W (Ta), 54W (Tc)150°CSMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 30V 13A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)30V13A (Ta)4.5V, 10V11.6 mOhm @ 6.5A, 10V2.3V @ 200µA20nC @ 10V±20V1350pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET P-CH 30V 1.4A UFM в производствеP-ChannelMOSFET (Metal Oxide)30V1.4A (Ta)4V, 10V240 mOhm @ 650mA, 10V
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±20V137pF @ 15V
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500mW (Ta)150°C (TJ)SMD Поверхностный монтажUFM3-SMD, Flat Leads
Toshiba Semiconductor and Storage MOSFET P-CH 60V 8A DPAK-3 в производствеP-ChannelMOSFET (Metal Oxide)60V8A (Ta)6V, 10V104 mOhm @ 4A, 10V3V @ 1mA19nC @ 10V+10V, -20V890pF @ 10V
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27W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 40V 10A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)40V10A (Ta)6V, 10V28 mOhm @ 5A, 10V3V @ 1mA10nC @ 10V±20V410pF @ 10V
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25W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 60V 8A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)60V8A (Ta)6V, 10V54 mOhm @ 4A, 10V3V @ 1mA10nC @ 10V±20V400pF @ 10V
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25W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 500V 3A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)500V3A (Ta)10V3 Ohm @ 1.5A, 10V4.4V @ 1mA7nC @ 10V±30V280pF @ 25V
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60W (Tc)150°C (TJ)SMD Поверхностный монтажDPAKTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 30V 60A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)30V60A (Ta)4.5V, 10V6.4 mOhm @ 30A, 10V2.3V @ 500µA40nC @ 10V±20V2700pF @ 10V
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63W (Tc)150°C (TJ)SMD Поверхностный монтажDPAKTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET P-CH 40V 10A DPAK-3 в производствеP-ChannelMOSFET (Metal Oxide)40V10A (Ta)6V, 10V44 mOhm @ 5A, 10V3V @ 1mA19nC @ 10V+10V, -20V930pF @ 10V
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27W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET P-CH 60V 15A DPAK-3 в производствеP-ChannelMOSFET (Metal Oxide)60V15A (Ta)6V, 10V50 mOhm @ 7.5A, 10V3V @ 1mA36nC @ 10V+10V, -20V1770pF @ 10V
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41W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET P-CH 40V 20A DPAK-3 в производствеP-ChannelMOSFET (Metal Oxide)40V20A (Ta)6V, 10V22.2 mOhm @ 10A, 10V3V @ 1mA37nC @ 10V+10V, -20V1850pF @ 10V
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41W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 40V 20A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)40V20A (Ta)6V, 10V14 mOhm @ 10A, 10V3V @ 1mA18nC @ 10V±20V820pF @ 10V
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38W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 60V 20A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)60V20A (Ta)6V, 10V29 mOhm @ 10A, 10V3V @ 1mA18nC @ 10V±20V780pF @ 10V
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38W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N CH 80V 24A SOP в производствеN-ChannelMOSFET (Metal Oxide)80V24A (Tc)10V12.3 mOhm @ 12A, 10V4V @ 300µA22nC @ 10V±20V1900pF @ 40V
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1.6W (Ta), 48W (Tc)150°C (TJ)SMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 40V 9A 8SOP в производствеP-ChannelMOSFET (Metal Oxide)40V9A (Ta)4.5V, 10V15 mOhm @ 4.5A, 10V2V @ 500µA64nC @ 10V+20V, -25V2900pF @ 10V
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1W (Ta)150°C (TJ)SMD Поверхностный монтаж8-SOP8-SOIC (0.154", 3.90mm Width)
Toshiba Semiconductor and Storage MOSFET N-CH 60V 30A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)60V30A (Ta)6V, 10V18 Ohm @ 15A, 10V3V @ 1mA28nC @ 10V±20V1350pF @ 10V
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58W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 40V 35A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)40V35A (Ta)6V, 10V10.3 mOhm @ 17.5A, 10V3V @ 1mA28nC @ 10V±20V1370pF @ 10V
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58W (Tc)175°C (TJ)SMD Поверхностный монтажDPAK+TO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N CH 30V 40A 8TSON-ADV в производствеN-ChannelMOSFET (Metal Oxide)30V40A (Ta)4.5V, 10V2.5 mOhm @ 20A, 10V2.3V @ 500µA40nC @ 10V±20V2230pF @ 15V
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700mW (Ta), 35W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 250V 5.6A 8SOP в производствеN-ChannelMOSFET (Metal Oxide)250V5.6A (Ta)10V198 mOhm @ 2.8A, 10V4V @ 200µA7nC @ 10V±20V600pF @ 100V
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1.6W (Ta), 42W (Tc)150°C (TJ)SMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET P-CH 30V 34A 8SOP-ADV в производствеP-ChannelMOSFET (Metal Oxide)30V34A (Ta)4.5V, 10V4.8 mOhm @ 17A, 10V2V @ 500µA115nC @ 10V+20V, -25V4800pF @ 10V
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1.6W (Ta), 45W (Tc)150°C (TJ)SMD Поверхностный монтаж8-SOP Advance (5x5)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 500V 5A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)500V5A (Ta)10V1.5 Ohm @ 2.5A, 10V4.4V @ 1mA11nC @ 10V±30V490pF @ 25V
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80W (Tc)150°C (TJ)SMD Поверхностный монтажD-PakTO-252-3, DPak (2 Leads + Tab), SC-63
Toshiba Semiconductor and Storage MOSFET N-CH 200V 7.2A 8TSON в производствеN-ChannelMOSFET (Metal Oxide)200V7.2A (Ta)10V114 mOhm @ 3.6A, 10V4V @ 200µA7nC @ 10V±20V600pF @ 100V
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700mW (Ta), 39W (Tc)150°C (TJ)SMD Поверхностный монтаж8-TSON Advance (3.3x3.3)8-PowerVDFN
Toshiba Semiconductor and Storage MOSFET N-CH 525V 5A DPAK-3 в производствеN-ChannelMOSFET (Metal Oxide)525V5A (Ta)10V1.5 Ohm @ 2.5A, 10V4.4V @ 1mA11nC @ 10V±30V540pF @ 25V
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80W (Tc)150°C (TJ)SMD Поверхностный монтажD-PakTO-252-3, DPak (2 Leads + Tab), SC-63
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